SPUTTER COATERS:
K500X, K550X

The K500X System employs a
Magnetron Target Assembly which enhances the efficiency of the process
using low voltages, and giving a Fine Grain, Cool Sputtering, without
the need to cool the target or the specimen stage.
The K500X has a Specimen Stage and
accommodates a range of specimens and stubs. The Chamber allows very easy access to
loading and removing specimens. The Instrument is fitted with Gold (or
Customer choice) quick change target, giving optimum consumable cost
performance. A range of targets are available including Gold/Palladium,
Platinum/Palladium and Platinum.
The integrated instrument panel and plug-in
electronics, maximise 'up-time' and, with user-friendly designs, ensures
satisfactory multi-user discipline, with manual operation by the user.
The Sputtering parameters can be pre-set,
including the gas bleed needle valve which has electromagnetic valve
back-up, so once set, it does not need to be adjusted. The sputtering
head is interlocked, and the system can easily accommodate the K250
carbon Coating Attachment.
The independent vacuum pump is controlled
by the Instrument.
| Features: |
Benefits: |
| Low voltage sputtering |
No cooling required |
| High resolution fine
coating (order of 2nm gold grain) |
Precise reproducible
coatings |
| Even thickness
deposition (typically 20nm or 200 angstroms for SEM work) |
Repeatable film
thickness depositions |
| 165mm diameter (6 inches)
chamber |
Easy loading and
unloading of specimens |
| Can be integrated with
Film Thickness Monitor |
Can pre-set deposition
thickness |
Specifications
of the K500X Sputter Coater:
Instrument Case - 450mm
W x 350mm D x 175mm H
Work Chamber - Borosilicate Glass 165mm Dia x 125mm H
Safety Shield - Polycarbonate
Weight - 18Kg
Target - 60mm Dia x 0.1mm Thick (Gold fitted as
Standard)
Specimen Stage - 60mm Dia.
Vacuum Gauge Range - ATM - 1x10-2 mbar
Deposition Range - 0-50mA
Deposition Rate - 0-25nm/Minute
Sputter Timer - 0-4 minutes
Pre-set Needle Valve - Control of Argon Supply
Services - Argon -
Nominal 5 psi
Vacuum Pump - Pump No. 5 complete with vacuum hose and
Oil Mist Filter.
Recommended 85L./Min. 5m3/Hr.
Electrical Supply - 230 Volts 50Hz (10 amp max.
including Pump)
115 Volts 60Hz (16 amp max. including Pump)
- K55OX
AUTOMATIC SPUTTER COATER WITH ROTATING SPECIMEN STAGE:

The K550X has a Rotating Specimen Stage
which can also be tilted, built in as standard and accommodates a range
of specimens and stubs, which together with pre-selectable parameters
and Fully Automatic Control, gives defined and repeatable film thickness
depositions.
Employing a Magnetron Target Assembly,
which enhances the efficiency of the process using low voltages, the
K550X gives a Fine Grain, Cool Sputtering, without the need to cool the
target or the specimen stage.
The Chamber is 165mm Diameter (6 inches),
which allows very easy access to loading and removing specimens. The Instrument is fitted with 60mm
Diameter and 0.1mm thick Gold (or Customer choice) quick change target,
giving optimum consumable cost performance. A range of targets are
available including Gold/Palladium, Platinum/Palladium and Platinum.
The integrated instrument panel and plug-in
electronics maximise 'up-time' and, with user-friendly designs, ensures
satisfactory multi-user discipline. With manual operation by the user.
The Sputtering parameters can be pre-set,
including the gas bleed needle valve which has electromagnetic valve
back-up, so once set, it does not need to be adjusted. The sputtering
head is interlocked, and the system can easily accommodate the K250
Carbon Coating Attachment. The independent vacuum pump is controlled
by the Instrument throughout the fully automatic coating cycle.
| Features: |
Benefits: |
| Fully Automatic Control |
Easy to operate |
| Low Voltage Sputtering |
No cooling required |
| High Resolution Fine
Coating (Order of 2nm Gold Grain) |
Precise reproducible
coatings |
| Special Rotating Stage
with full Tilt Facility fitted as standard |
Fully adaptable to a
wide range of specimens |
| Even Thickness
Deposition (Typically 20nm or 200 Angstroms for SEM work) |
Repeatable film
thickness depositions |
| 165mm Diameter (6 inches)
Chamber |
Easy loading and
unloading of specimens |
| Can be integrated with
Film Thickness Monitor |
Can pre-set deposition
thickness |
Specifications
of the K550X Sputter Coater:
Instrument Case - 450mm
W x 350mm D x 175mm H
Work Chamber - Borosilicate Glass 165mm Dia x 125mm H
Safety Shield - Polycarbonate
Weight - 18Kg
Target - 60mm Dia x 0.1mm Thick (Gold fitted as
Standard)
Specimen Stage - 60mm Dia. Rotating Stage with Tilt
facility. (Spacing to Target 40mm)
Vacuum Gauge Range - ATM - 1x10-4 mbar
Deposition Range - 0-50mA
Deposition Rate - 0-25nm/Minute
Sputter Timer - 0-4 minutes
Pre-set Needle Valve - Control of Argon Supply
Services - Argon - Nominal 5 psi
Vacuum Pump - Double stage Rotary Vacuum Pump, complete
with
Recommended vacuum hose and Oil Mist Filter.
Electrical Supply - 230 Volts 50Hz (10 amp max.
including Pump)
115 Volts 60Hz (16 amp max. including Pump)