SPUTTER COATERS K500X, K550X

K500X SPUTTER COATER WITH MAGNETRON TARGET ASSEMBLY

The K500X System employs a Magnetron Target Assembly which enhances the efficiency of the process using low voltages, and giving a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
The K500X has a Specimen Stage and accommodates a range of specimens and stubs.
The Chamber allows very easy access to loading and removing specimens.
The Instrument is fitted with Gold (or Customer choice) quick change target, giving optimum consumable cost performance. A range of targets are available including Gold/Palladium, Platinum/Palladium and Platinum.

The integrated instrument panel and plug-in electronics, maximise 'up-time' and, with user-friendly designs, ensures satisfactory multi-user discipline, with manual operation by the user.
The Sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up, so once set, it does not need to be adjusted. The sputtering head is interlocked, and the system can easily accommodate the K250 carbon Coating Attachment.
The independent vacuum pump is controlled by the Instrument.

Specifications of the K500X Sputter Coater

• Instrument Case: 450mm W x 350mm D x 175mm H
• Work Chamber: Borosilicate Glass 165mm Dia x 125mm H
• Safety Shield: Polycarbonate
• Weight: 18Kg
• Target: 60mm Dia x 0.1mm Thick (Gold fitted as Standard)
• Specimen Stage: 60mm Dia.
• Vacuum Gauge Range: ATM - 1x10^-2 mbar
• Deposition Range: 0-50mA
• Deposition Rate: 0-25nm/Minute
• Sputter Timer: 0 - 4 minutes
• Pre-set Needle Valve: Control of Argon Supply
• Services
• Argon: Nominal 5 psi
• Vacuum Pump: Pump No. 5 complete with vacuum hose and Oil Mist Filter.
• Vacuum: Recommended 85L./Min. 5m3/Hr.
• Electrical Supply: 230 Volts 50Hz (10 amp max. including Pump)

K55OX AUTOMATIC SPUTTER COATER WITH ROTATING SPECIMEN STAGE

The K550X has a Rotating Specimen Stage which can also be tilted, built in as standard and accommodates a range of specimens and stubs, which together with pre-selectable parameters and Fully Automatic Control, gives defined and repeatable film thickness depositions.
Employing a Magnetron Target Assembly, which enhances the efficiency of the process using low voltages, the K550X gives a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
The Chamber is 165mm Diameter (6 inches), which allows very easy access to loading and removing specimens.
The Instrument is fitted with 60mm Diameter and 0.1mm thick Gold (or Customer choice) quick change target, giving optimum consumable cost performance. A range of targets are available including Gold/Palladium, Platinum/Palladium and Platinum.
The integrated instrument panel and plug-in electronics maximise 'up-time' and, with user-friendly designs, ensures satisfactory multi-user discipline. With manual operation by the user.
The Sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up, so once set, it does not need to be adjusted. The sputtering head is interlocked, and the system can easily accommodate the K250 Carbon Coating Attachment.
The independent vacuum pump is controlled by the Instrument throughout the fully automatic coating cycle.

Features	Benefits
Fully Automatic Control	Easy to operate
Low Voltage Sputtering	No cooling required
High Resolution Fine Coating (Order of 2nm Gold Grain)	Precise reproducible coatings
Special Rotating Stage with full Tilt Facility fitted as standard	Fully adaptable to a wide range of specimens
Even Thickness Deposition (Typically 20nm or 200 Angstroms for SEM work)	Repeatable film thickness depositions
165mm Diameter (6 inches) Chamber	Easy loading and unloading of specimens
Can be integrated with Film Thickness Monitor	Can pre-set deposition thickness

 

Specifications of the K550X Sputter Coater

• Instrument Case: 450mm W x 350mm D x 175mm H
• Work Chamber: Borosilicate Glass 165mm Dia x 125mm H
• Safety Shield: Polycarbonate
• Weight: 18Kg
• Target: 60mm Dia x 0.1mm Thick (Gold fitted as Standard)
• Specimen Stage: 60mm Dia. Rotating Stage with Tilt facility. (Spacing to Target 40mm)
• Vacuum Gauge Range: ATM - 1x10^-4 mbar
• Deposition Range: 0 - 50mA
• Deposition Rate: 0 - 25nm/Minute
• Sputter Timer: 0 - 4 minutes
• Pre-set Needle Valve: Control of Argon Supply
• Services
• Argon: Nominal 5 psi
• Vacuum Pump: Double stage Rotary Vacuum Pump, complete with Recommended vacuum hose and Oil Mist Filter.
• Electrical Supply: 230 Volts 50Hz (10 amp max. including Pump)

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