SPUTTER COATER: K575X
& K575XD Turbo Pumped Resolution Sputter Coater
The K575X uses a 'Turbo'
pump, backed by a Rotary Vacuum pump, the complete pumping sequence
being under automatic control.
The vacuum can be adjusted to suit
conditions for Chromium or other oxidising metals, as well as Gold
targets, and has a Timer to allow for a range of sputtering times.
The Systems employs a Magnetron Target
assembly, fitted with a 54mm Dia. quick change target.
The sputter head is Peltier Cooled to
give high performance, fine grain coatings (no water requirements
needed)
The Sputtering parameters can be pre-set
including gas bleed needle valve, which has electromagnetic valve back
up.
The K575XD (Dual Head),
version of the above has two sputter heads. These are arranged such that
for special coating applications, two sequential layers of a target
material can be deposited without breaking the vacuum seal in this
automatic unit.
Note: Whilst the overall
specification is the same as the K575X, the K575XD has two heads. The
K575X has peltier cooling for very thick depositions normally associated
with the K575XD (Dual) unit it may be necessary to supplement with water
cooling as required.
Features:
- Fully automatic control
- Peltier cooled sputter head
- Fine coating (order of 0.5nm Cr Grain
Size)
- Special Rotating Stage with Full Tilt
Facility fitted as standard
- Thin Film Deposition (typically 5nm)
- 165mm Diameter Chamber
- Dual Sputter Head available as an
option
- Can be integrated with Film Thickness
Monitor
Benefits:
- Allows sputtering of fine grain
oxidising metals such as Cr or Ir
- Easy to operate
- No cooling water required
- Ultra high resolution reproducible
coatings
- Fully adaptable to a wide range of
specimens
- Repeatable film thickness depositions
- Easy loading and unloading of samples
- Allows sequential coatings to be made
without breaking vacuum
- Can pre-set deposition thickness
Specifications
of the K575X Splutter Coater:
Instrument Case - 450mm
W x 350mm D x 175mm H
Work Chamber - Borosilicate Glass 165mm Dia x 125mm H
Safety Shield - Polycarbonate
Plus Base - 110mm Dia x 115mm H
Weight - 42Kg
Target - 54mm Dia x 0.2mm Thick Chromium fitted as
standard
Specimen Stage - 60mm Dia Rotate Stage with Tilt
Facility
Vacuum Gauge Range - Atmosphere to 1 x 10-5
mbar
Operating Vacuum - 1 x 10-3 mbar to 1 x 10-4
mbar
Deposition Current - 0-150mA
Deposition Rate - 0-20nm/Minute
Sputter Timer - 0-4 minutes
Turbomolecular Pump - 60 litres/Second (Ultimate vacuum
1x10-8 mbar)
Services - Argon - Nominal 10 psi
Nitrogen- Nominal 10 psi (Argon may be used as common gas)
Vacuum Pump - Pump No 2. complete with Vac. Hose &
Oil Mist Filter 35L/Min 2m3/Hr
Electrical Supply - 230 Volts 50Hz (6 Amp max.
including Pump)
115 Volts 60Hz (12 Amp max. including Pump)
