SPUTTER COATER: K650X
Large Sample Coater with Triple Head Sputtering
There are three magnetron
target assemblies in the K650X, positioned to give coating over a large
diameter which, together with a rotating sample table, ensures even
depositions. This method allows standard targets to be utilised, and
avoids the necessity of special large profiled targets.
This triple sputter target system is
particularly useful in the Semiconductor Wafer Industry.
The magnetron target assemblies employed
on this system enhance the efficiency of the process using low voltages,
and giving a fine grain, cool sputtering, without the need to cool the
target or the specimen stage.
The Instrument is fitted with three 60mm
diameter and 0.1mm thick gold (or Customer choice) quick change targets,
giving optimum consumable cost performance.
The integrated instrument panel and plug-in
electronics, maximise 'up-time' and, with user friendly designs, ensure
satisfactory multi-user discipline.
The sputtering parameters can be pre-set,
including the gas bleed needle valve which has electromagnetic valve
back-up which, together with automatic control, gives defined and
repeatable film thickness depositions.
The sputtering head is interlocked, and
the system can easily accommodate the K250 Carbon Coating Attachment.
The independent vacuum pump is controlled
by the instrument throughout the fully automatic coating cycle.
K650XT Turbo Unit is as
detailed above but has turbo pumping at 60L/Second for a higher &
cleaner vacuum.
Features:
- Triple target sputtering system
- Fully Automatic Control
- Low Voltage Sputtering
- High Resolution Fine Coating (Order of
2nm Gold Grain)
- Special Rotating Stage with full Tilt
Facility fitted as standard
- Even Thickness Deposition (Typically
20nm or 200 Angstroms for SEM work)
- 225mm Diameter (6 inches) Chamber
- Can be integrated with Film Thickness
Monitor
Benefits:
- Ideal for large samples such as
silicon wafers
- Easy to operate
- No cooling required
- Precise Reproducible Coatings
- Fully adaptable to a wide range of
specimens
- Repeatable film thickness depositions.
- Easy loading and unloading of large
samples – up to 6” wafers
- Can pre-set deposition thickness
Specification:
Instrument Case - 450mm
W x 350mm D x 175mm H
Work Chamber - Borosilicate Glass 225mm Dia x 125mm H
plus base - 110mm Dia x 115mm H
Safety Shield - Polycarbonate
Weight - 24Kg
Target - Three x 60mm Dia x 0.1mm Thick.
Rotating - 155mm Dia. Adjustable
Specimen Stage - Height spacing to target 40 to 50mm
Vacuum Gauge Range - ATM - 1x10-2 mbar
Deposition Range - 0-100mA
Deposition Rate - 0-20nm/Minute
Sputter Timer - 0-4 minutes
Services - Argon -
Nominal 4 psi
Vacuum Pump - Pump No. 10 10m3/Hr complete with vacuum
hose and Oil Mist Filter
Electrical Supply - 230 Volts 50Hz (8 amp Max.
Including Pump)
115 Volts 60Hz (16 amp max. including Pump)
