CARBON AND METAL EVAPORATOR K975X

K975X High Vacuum Turbo Evaporator for Multiple Thin Film Applications

The K975X Turbo Evaporator, is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens.

It allows for Carbon Evaporation, Metal Evaporation from both Baskets and Crucibles and a Sputter Coating option.< br />
A range of techniques can be practiced including carbon support films and replicas for TEM, Carbon/Metal Evaporation, Low Angle Shadowing and sequential layer coatings using dual source evaporation and the Sputter Coating option can be used for a range of target materials.

The system flexibility is further enhanced by the use of a microcontroller, which readily allows the Customer access to a range of options, but readily 'defaults' to optimum operating conditions, allowing both fully automatic and manual override as required.

The unique Loading Rack out Drawer sample system gives the user easy sample access with good sample size and the hinged lid assembly makes any other areas of the system readily accessible.

The unit has a Turbo Pump, externally mounted for convenience and easy exchange, and is backed up by a Rotary Vacuum Pump. The complete pumping sequence is under fully automatic control, achieving a high vacuum for evaporation.

The Unit is bench mounted, with easy to use controls, and cannot be damaged by inadvertent use.

The K975s is based on the K975X, however it has a special load lock door which allows the entry of 8" wafer for carbon coating, with applications such as FIB work.

Specifications of the K975X High Vacuum Evaporator

• Instrument Case: W 450mm x D 500 x H 300mm
• Borosilicate Glass Work Chamber with Hinged Top Plate: Dia: 250mm x H: 300mm (can accommodate samples to 200 mm) (8") in Dia.
• Safety Polycarbonate Implosion Guard: To suit work chamber readily removable for maintenance
• Weight: 65Kg.
• Carbon Gun: Adjustable height with Tilt Control 0-20^o. Uses 6.15mm Carbon Rods
• Turbomolecular Pump: - 100L/Seconds as Standard Optional Sizes Available
• Vacuum Gauges: Active Gauge Head Atm to 1x10^-7 mbar.
• Working Vacuum: within 15 minutes
• Operating Vacuum: Into x10^-5 mbar range (Liquid Nitrogen Trap Option Available)
• Evaporation Supply (Pulsed or Variable Control): 4 x Selectable, Low Voltage Volts a.c. V, 5V, 15V,25V @ 25 amps. 7V @100 amps
• Specimen Table: With Tilt Facility 0-45^o
• Rotating Specimen Table Option: 60mm Dia.Tilting 0-45^o, with Variable Speed Control 15rpm To 45rpm
• Sputtering Option: Deposition: 0 - 100mA Deposition Rate: 0 - 50nm/Minute Gold (Au)
• Standard Target: 57 mm Au (options Pt, Pt/Pd, Pd, Ni, Cu, Ag)
• Timer: 0 to 4 Minutes
• HT Safety Interlocked
• Film Thickness Option
• Glow Discharge Option
• Services
• Argon: (For Sputtering option) Nominal 4 psi
• Vacuum Pump: No2 Pump (2m3/Hr) pumping speed Oil Mist Filter, Vacuum Hose. (Included with Instrument)
• Electrical supply: 230 Volts - 50/60Hz - 8 amp normal Including pump.

Note: In Circuits with Current Trips , when using Pulse for 230 v a 16 amp minimum

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