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RF PLASMA ETCHING / ASHING: K1050X RF Plasma Etcher / Asher / Cleaner

  • K1050X RF PLASMA:

The K1050X Plasma Treatment Unit consists of a solid state RF generator and associated tuning circuits, dual process gas flow monitoring needle valve control and full or restricted vent control.

It has a cylindrical Chamber with a rack out drawer system for ease of sample loading.

The vacuum system is a Dual stage separate Rotary Vacuum Pump or Optional Turbo Pumped backed by Diaphragm Pump.

The rack out drawer system can be exchanged for a vacuum loading port, for special cleaning applications in SEM/TEM.

This usually employs an Oxygen/Argon mix of gases, the Oxygen removing the organic material (hydrocarbons) and the Argon giving a surface etching of the sample.

Applications:

  • Asbestos sample preparation
  • Microincineration of organic material
  • Etching of organic samples for SEM & TEM work
  • Removal of Photoresist and electronc component encapsulations
  • Surface treatment of plastics
  • Cleaning of SEM/TEM sample holders

Features:

  • Solid State RF Generator and associated tuning circuits
  • Fully Automatic Control
  • Rack out drawer
  • Dual process gas flow
  • Compact bench-top system

Benefits:

  • Low temperature ashing process
  • Easy to operate
  • Easy loading/removal of samples
  • Can select a mixture of gases
  • Space saving

NOTE: We recommend that our No. 2 pump is used with unit as 'special oil' dedicates the application.

Specification of the K1050X Plasma Unit:

Instrument Case: 450mm W x 350mm D x 300mm H.
Barrel Work Chamber: 'Pyrex' 160mm L x 110mm Dia. (Borosilicate Glass as standard.)
Rack Out Drawer: Sliding Draw Assembly with Sample Holder Tray.
Plasma Output: RF Power Supply - Solid state 100 Watts RF Peak, Normal operating Range 25 to 75 Watts @ 13.56mhz.
(Note: The frequency used is that allocated by the International Standards CISPR as an allowed 'industrial' frequency.)
Vacuum Gauge: Active Gauge Head with fully operating vacuum range display (ATM to 1x10-5 mbar. Full scale - normal operating vacuum 0.5mbar to1.0mbar)
Digital Timer Unit: Displays elapsed time with range select: 99.9Hours. Automatic termination of Ashing Process.
Dual Gas Flow Gauges: Dual Gas Needle Valve Flow Control, selectable for 1 or 2 or both gasses (calibrated 5 to 100cm3/minute Air @ A.T.P.)
Weight: 25Kg.
Supply: 230Volts 50Hz (5 amp max. including. Pump) 115 Volts 60Hz (10 amp max. including Pump)
Services: Process Gas at nominal 5 psi, (0.33bar)
Vacuum Pump: No. 2 Pump (with a synthetic oil 'Fomblin' for Oxygen or Corrosive Process Gases.) 2m3/Hr

ÁREAS DE TRABAJO:

Equipos de  preparación de Muestras:
Material de Microscopia Electrónica
Material General de Laboratorio

Materiales de Referencia Certificados

Microbiología

 Standards

Accesorios IR

Control de Calidad

Analizadores de NIR

FEDELCO, S.L.      C/ Lago Constanza, 46  28017 MADRID      TEL: 91 408 16 25      FAX: 91 408 16 90       E-mail: informacion@fedelco.com       Web: www.fedelco.com