SPUTTER COATER: SC3000
Turbo Pumped Large Sample High Resolution System
The SC3000 Sputtering Coater
System can coat complete 12 inch (300mm) wafers. Three sequential
coatings can be achieved without breaking vacuum, offering multi- target
sputtering.
This high vacuum, high resolution coating
system gives fine and precise, reproducible coatings.
There are three Magnetron target
assemblies in the SC3000, positioned to give coating over a large
diameter which, together with a rotating sample table, ensures even
depositions. This method allows standard targets to be utilised, and
avoids the necessity of special large profile targets.
The target system is particularly useful
in the semi-conductor wafer industry. It has a turbomolecular pump
backed by a Rotary Vacuum Pump.
The integrated instrument panel and
plug-in electronics, maximise 'up-time' and, with user friendly designs,
ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set,
including the gas bleed needle valve, which has electromagnetic valve
back-up.
The independent Vacuum Pump is controlled
by the Instrument throughout the fully automatic coating cycle. It can
be used to Sputter Coat targets such as Gold, and also targets that may
need pre-cleaning, or the removal of oxide layers, such as Chromium.
A shutter assembly is fitted as standard,
which allows a Sputter Cleaning and the Sputter Cycle to be carried out
while maintaining the vacuum.
Features:
- Modular control electronics
- Clean line design
- Rotating Specimen Stage
- Multi- Target Sputtering (With Sputter
Cleaning Shutter Assembly)
- LCD Status/Data Entry Display
- Customer menu input allows up to 10
stored protocols
- LCD Conditions Display (Vacuum, Time
and Current)
- Active Vacuum Gauge Head (giving full
Vacuum operating range)
- Turbo Molecular Drag Pump with full
ISO 100 Flange, (larger pump option) 240 L/sec
- Fast Cycle time fully automatic
including purging - 15 minutes
- Peltier Cooled Targets - no water
requirements
- Three sequential coatings without
breaking vacuum.
Specifications
of the SC3000 Sputtering System:
Instrument Case - 450mm
W x 500mm D x 300mm H (Overall height of unit 650mm)
Work Chamber - Stainless Steel 300mm Dia. x 200mm H
(With viewing Window)
Weight - 55Kg
Targets - Three x 57mm Dia. x 0.3mm Thick Chromium as
Standard (optional range of targets available eg Gold, Platinum,
Gold/Palladium)
Rotating Specimen Stage - Adjustable for 6 to 12 inch
Wafers, Height spacing to target 60mm
Vacuum Gauge - Atmos. - 1 x 10-5 mbar
Deposition - 0-750mA
Deposition Rate - 0-10 nm/minute
Sputter Timer - 0-4 minutes
Supply - 230 Volts 50Hz (10 Amp max. including pump)
115 Volts 60Hz (20 Amp max. including pump)
Services - Argon - Nominal 10 psi
Nitrogen - Nominal 10 psi (Argon may be used as common
gas)
Rotary Backing Pump- Two Stage Vacuum Pump No5, 85L/Min
complete with Vacuum Hose and Oil Mist Filter. 8m3/Hr.
